Abstract
The parts of magnetron sputtering system were given in the paper. Meanwhile, we analyzed the working theory of magnetron sputtering. After pure zinc oxide (ZnO) film was grown, N-doped films was Prepared in NH3-O2-Ar atmosphere using zinc as a target, and Al-doped and N+Al codoped ZnO films were grown by co-sputtering technique using zinc and aluminum as targets. AFM showed the crystal quality of the Films. The results of experiment demonstrate that high-quality films have been achieved by this technique, and research on ZnO films can be done by the equipment.
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