Abstract
Electro hydrodynamic jet (E-Jet) deposition technology is used to deposit PZT thick films on Si substrate. The effect ofE-Jet deposition working distance, flow rate and slurry mixing condition on the characteristics of PZT thick films are examined. The results show that the reduction of working distance and flow rate can help to increase the density of PZT thick film. The mixing of PZT composite slurry using ball-milling method can significantly improve compactness of the deposited thick films. By using optimum E-Jet deposition parameters and slurry ball-milling time of 20h, crack-free PZT thick films with a thickness of 10μm is deposited, it exhibits a relative permittivity of 255 and d33 of 67 pC·N-1.
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