Abstract
SPR phase detection method is adopted in this paper to measure the thickness of nanometer scale metal film. It provided a novel means to calculate the value of thickness through figuring up the relative offset of interference fringes with the TM-polarized and TE-polarized wave reflected from the prism which is covered by a film-substrate step. Simulation results are presented out to illustrate the relations between phase variation and metal film thickness. This method is succeeded in measuring the target metal film with nominal thickness 50 nm and the average measurement value is 50.02 nm. The standard deviation is 0.41 nm and the maximum repeatability error is 0.90 nm.
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