Reprint of: Improving oxidation and wear resistance of TiB2 films by nano-multilayering with Cr

Abstract

Alternating TiB2-DCMS and Cr-HiPIMS layers are used to fabricate TiB2/Cr multilayer films with varying the Cr interlayer thickness, 2 and 5 nm, and the substrate bias during growth of Cr interlayers from floating, to −60 V and −200 V. The effects of multilayer structure on mechanical properties, static oxidation, and tribological behavior of the TiB2/Cr multilayers are investigated. The results reveal that TiB2 nanocolumns renucleate at each Cr interface maintaining smooth film surface and film density. Interlaying with Cr with thicknesses of 2–5 nm improves the resistance to oxidation at 500–600 °C as compared to TiB2 monolayer. The increase of the thickness of the Cr interlayers from 2 to 5 nm decreases the hardness of the multilayer slightly but deteriorates the wear rate significantly. The friction coefficients at 500 °C are lower than those at RT due to boric acid liquid lubrication induced by surface oxidation. The TiB2/Cr multilayer films show higher wear resistance than TiB2 monolayer. The multilayer films with 2 nm-thick Cr deposited at −60 V have the lowest recorded wear rates. Irradiation with 200 eV Cr+ leads to interface mixing, resulting in the formation of B-deficient TiBx phase (x < 2) and higher wear rates compared to multilayers grown at −60 V.