Abstract
In this study, a new cleaning process with a low cost of ownership (CoO) was developed with ozonated DI water (<TEX>$DIO_3$</TEX>). An ozone concentration of 40 ppm at room temperature was used to remove organic wax film and particles. Wax residues thicker than <TEX>$200\;{\AA}$</TEX> remained after only a commercial dewaxer treatment. A <TEX>$DIO_3$</TEX> treatment in place of a dewaxer showed a low removal rate on a thick wax layer of <TEX>$8000\;{\AA}$</TEX> due to the diffusion-limited reaction of ozone. A dewaxer was combined with a <TEX>$DIO_3$</TEX> rinse to reduce the wax removal time and remove wax residue completely. Replacing DI rinse with the <TEX>$DIO_3$</TEX> rinse resulted in a surface with a contact angle of less than <TEX>$5^{\circ}$</TEX>, which indicates no further cleaning steps would be required. The particle removal efficiency (PRE) was further improved by combining a SC-1 cleaning step with the <TEX>$DIO_3$</TEX> rinsing process. A reduction in the process time was obtained by introducing <TEX>$DIO_3$</TEX> cleaning with a dewaxing process.
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