Abstract
Removal of Hg0 using two homogeneous Photo‐Fenton‐Like reactions was first investigated in a photochemical reactor. Effects of process parameters on Hg0 removal were studied. Free radical and reaction products were analyzed. Removal pathways of Hg0 were discussed. Simultaneous removal of Hg0, NO, and SO2 is also studied briefly. The results show that UV power, wavelength, H2O2 concentration, and solution pH have great effects on Hg0 removal. Hg0, and SO2 concentrations, solution temperature, Fe3+, Cu2+, , and concentrations also have significant effects on Hg0 removal. However, concentrations of CO2, NO, O2, Cl−, , , SiO2, Al2O3, and Fe2O3 only have slight effects on Hg0 removal. Hg0/NO/SO2 can be simultaneously removed by Photo‐Fenton‐Like reactions. ·OH was captured, and / /Hg2+ were also detected. Removals of Hg0 by photochemical oxidation and ·OH oxidation play a major role, and removal of Hg0 by H2O2 oxidation only plays a secondary role in removal of Hg0. © 2015 American Institute of Chemical Engineers AIChE J, 61: 1322–1333, 2015
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