Abstract

Diamond-like carbon (DLC) film is sometimes removed using oxygen plasma in order to reuse workpieces such as cutting tools and press molds. In this study, an oxygen-dominated plasma beam was generated by converting the cathodic carbon arc plasma beam formed in T-shaped filtered-arc-deposition (T-FAD) in order to investigate the feasibility of using the plasma beam for the removal of DLC film. When the oxygen (O2) gas flow rate was relatively high (50 ml/min) and the substrate was biased (DC -500 V), the plasma beam in front of the substrate was confirmed to contain a considerable amount of excited oxygen atoms, since an atomic oxygen spectral line (777 nm) emitted from the plasma beam had relatively strong radiation intensity. The plasma beam was irradiated on a tetrahedral amorphous carbon film, a hydrogen-free sp3-rich DLC film, prepared on a hard alloy (WC with 6 wt % Co binder) substrate. It was found that a plasma beam generated with an appropriate O2 gas flow rate and applied substrate bias was able to etch the DLC film proportionally to the treatment time. The surface was not roughened when the treatment time was 1.5 times longer than the intended time to remove a given thickness of DLC film.

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