Abstract
Abstract This paper is devoted to the discussion of insulating aluminium oxide layers deposited on metallic substrates in the afterglow region of a microwave oxygen plasma. The chosen organometallic precursor, trimethylaluminium (TMA), has high vapour pressure and reactivity. The experimental set-up is described and the influence of the deposition parameters on deposition rate, physical and chemical properties of the coatings is presented. Deposition rates range from 0.05 to 0.2 μm min −1 . Microwave power and pressure ranges are limited by the formation of particles produced by homogeneous nucleation in the gas phase for high values. Weight gain, which illustrates the deposition rate, is strongly dependent on the precursor flow rate. Density and chemical composition are improved by deposition temperature. The main impurities are CH x groups. High compressive stresses and electrical resistivity are well suited for the planned uses of these coatings at high temperature on turbine blades.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
