Reliability assessment of Algangan Hemts for high voltage applications based on high temperature reverse bias test

Abstract

We have submitted the AlGaN/GaN High electron mobility transistors (HEMTs) to the high temperature reverse bias(HTRB) stress to assess their reliability for high voltage operations. The effects of HTRB stress as a function of the V DG and stress time on the DC parameters and trapping effects were investigated. The study was based on combined DC and pulsed characterization, transient measurement. It provides the following information: 1) the exposure to HTRB may result in a permanent degradation in on-state current, the transconductance, and a slightly positive shift of threshold voltage; 2) the high temperature (T A =175°C) step reverse bias (V DG stepped from 20V to 80V) stress tests revealed that the gate leakage current I GS increased abruptly after 50V stress voltage V DG ; 3) interestingly, the long term high temperature moderate reverse bias(V DG 40V) stress resulted in some positive effects such as the decrease of gate leakage current, improved gate lag characteristics and the decrease of current collapse in pulsed measurement during the whole test; 4) the reverse-bias voltage is the key factor but for reliability assessment of AlGaN/GaN HEMTs for high voltage application based on HTRB stress; 5) The degradation mechanism of the gate leakage current under relatively high voltage HTRB test has been ascribed to the degradation metal and semiconductor interface; 6) the improved I-V characteristic under moderately voltage HTRB test has been attributed to the reduction of lateral tunneling current.