Abstract
Metal impurity release from structural defects in polycrystalline silicon was studied following thermal treatments, and, in addition, a correlation between impurity distributions and structural defects was established. Impurities were mapped with synchrotron-based x-ray fluorescence in the as-grown state, after rapid thermal annealing and following aluminum gettering treatments. The goal of this work was to determine if impurity release from structural defects limits gettering of metal impurities. The results reveal that nickel and copper metal impurities are primarily found at dislocations in as-grown crystals, and the release of these impurities from defects occurs rapidly with no apparent barrier to dissolution. Gettering treatments dissolved metal impurity precipitates to <2–5 nm in radii; however, the material performance was not greatly enhanced.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.