Abstract

Hydrogenated amorphous silicon–sulfur alloy (a-SiSx:H) films were rapidly cooled to a temperature at which electrical conduction is normally achieved by a hopping process. In the rapidly cooled state of sulfur-doped hydrogenated amorphous silicon (a-SiS:H) with approximately 0.5 at.% S, the conductivity follows the activated process that dominates at higher temperatures. With time at low temperatures, the conductivity gradually increases and the mechanism is probably hopping conduction. The time dependence of this increase in conductivity is consistent with a stretched-exponential function with a thermal activation energy of about 0.2±0.1 eV and a stretched-exponential exponent of approximately 0.8 independent of temperature.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.