Abstract
We report the relative intensity noise (RIN) characteristics of an InAs quantum dot (Qdot) laser epitaxially grown on the Ge substrate. It is found that the minimum RIN of the Ge-based Qdot laser is around −120 dB/Hz, which is 15 dB higher than that of a native GaAs-based Qdot laser with the same layer structure. The higher RIN in the Ge-based laser can be attributed to the high-density epitaxial defects of threading dislocations and antiphase domain boundaries.
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