Abstract
Deposition of ω-tricosenoic acid films was tried by the Langmuir-Blodgett (LB) and vacuum deposition (VD) method, and structures and polmerizabilities of the films were investigated for applications to thin resist film. It was shown that the LB and VD films had predominant molecular orientation tilted to the substrate normal, and that the LB films had larger molecular tilt angles than those of the VD films. Moreover, it was proved that the polymerizability of ω-tricosenoic acid film was dependent on the molecular tilt angle.
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