Abstract

TiO2 thin films with different crystalline structures were prepared by the CVD method. The relationship between photocatalytic activity of a TiO2 thin film and its crystalline type was investigated. These films were characterized by XRD and AFM. Their photocatalytic properties were tested by the degradation of NO2-. The results showed that the crystalline structures of TiO2 thin films are primary anatase and/or rutile when the preparation temperatures were less than 573 K and higher than 773 K respectively. When the preparation temperature was around 623 K, the structures of TiO2 thin films were mixed crystalline structure, which showed the highest catalytic activity. When the ratio of rutile to anatase in TiO2 thin films fell between 0.5 and 0.7, the highest catalytic activity for the degradation of NO2- was found.

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