Abstract

Fixed abrasive is taking the place of loose abrasive owing to its high efficiency and little pollution. The self-conditioning ability of fixed abrasive pads (FAPs) plays a favorable role in the lapping process. In this paper, agglomerated diamond (AD) abrasives were prepared for the sapphire lapping process. Material removal rate (MRR), material removal rate variation (MRRV) and surface topography of sapphire wafers lapped by fixed AD abrasive pad were investigated. Abrasive wear and wear debris were characterized. The material removal mechanisms of AD abrasives were discussed. Comparison of mechanical properties between AD and SD in abrasive wear process was analyzed. Influence of mechanical properties of AD abrasives on processing performance was explained. Comparing with fixed single diamond (SD) abrasive pads, the higher MRR, the lower MRRV and surface roughness of sapphire wafer were obtained in the fixed AD abrasive lapping process. Stable large protrusion height and consecutive sharp edges of AD abrasives ensure the excellent lapping performance. The protrusion height of abrasives is positive correlated with the self-conditioning ability of FAPs. The stable protrusion height of AD abrasives is attribute to two points: one is the rough surface of an AD abrasive with multiple sharp cutting edges improves the bonding strength between the abrasives and the pad matrix; the other is the detached diamond particles due to the micro-fracture phenomenon of AD abrasives accelerates the abrasion of matrix.

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