Abstract
The regularities of microstructural elements formation in UV-curable nanocomposite by deep and interference lithography methods have been studied. The dependency of dimensional characteristics of microstructural elements on the amplitude mask parameters, exposure level, layers thickness has been established. The ways to reduce characteristic sizes of microstructural elements and to increase an aspect ratio have been obtained. A possibility to realize an interference method has been shown and diffraction characteristics of the structures determined.
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