Abstract

Reflectance anisotropy spectroscopy (RAS) has been employed in situ to investigate the overlayer growth of GaAs onto submonolayer to one monolayer coverages of Si δ layers deposited on the GaAs(001)-c(4×4) surface. The intensity of RAS features, thought to arise from the linear electro-optic (LEO) effect, is found to vary with both the number of atoms in the Si δ layer and the position of the δ plane from the GaAs surface. Self-consistent solutions to Poisson’s equation are made to calculate the electric field in the near-surface region of the samples. The results show a direct correlation between the LEO intensity and the surface field averaged over the penetration depth of the incident radiation, in confirmation of the LEO model.

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