Abstract
Carbon-nitride multilayer systems were synthetized on silicon substrates by r.f. magnetron sputtering with alternatively changing the sputtering plasma composition between pure Ti+C and Nb elements under a reactive mixture of Ar/N2. Bilayer numbers were increased from nanometric range (15 nm) to higher micrometric range (1.5 μm). The structural and chemical properties were analyzed by X-ray diffraction, X-ray photoelectron spectroscopy (XPS), cross-sectional transmission electron microscopy (TEM), Electron energy loss spectroscopy (EELS) and optical properties via color purity. The multilayer period effect on the optical properties such as color purity was studied and the color dependence as function of bilayer number with niobium (Nb) modulation in the TiCN/TiNbCN system determined. The spectra for all layers showed high reflectances at large wavelengths, e.g. 92% for the TiNbCN layer, 89% for the TiCN layer and about 75% for the TiCN/TiNbCN multilayer deposited with n = 200, Λ = 15 nm, So the changes in the color purity in relation to (Nb) fluctuation can be applied in optical and industrial applications.
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