Abstract
A model of formation of secondary ion during ion-beam sputtering of a target is considered. The model is based on the so-called “statistical model” of formation of secondary ions at a certain critical distance from the surface, which was proposed earlier. The concept of dynamic temperature introduced in earlier publications for a cascade of collisions initiated by a primary ion, as well as a new interpretation of the interaction of the formed ion with the surface charge of opposite polarity, enabled us to derive an analytic expression for the ion formation probability. Comparison of the results of calculation with experimental data shows good agreement testifying the correctness of the proposed model.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.