Abstract

In order to enhance the mechanical strength of Low-E glass, Fluorine-doped tin oxide (FTO) films have to be tempered at high temperatures together with glass substrates. The effects of tempering temperature (600 °C ~ 720 °C) and time (150 s ~ 300 s) on the structural and electrical properties of FTO films were investigated. The results show all the films consist of non-stoichiometric, polycrystalline SnO2 without detectable amounts of fluoride. 700 °C and 260 s may be the critical tempering temperature and time, respectively. FTO films tempered at 700 °C for 260 s possesses the resistivity of 7.54 × 10−4 Ω•cm, the average transmittance in 400 ~ 800 nm of ~80%, and the calculated emissivity of 0.38. Hall mobility of FTO films tempered in this proper condition is mainly limited by the ionized impurity scattering. The value of [O]/[Sn] at the film surface is much higher than the stoichiometric value of 2.0 of pure crystalline SnO2.

Highlights

  • Due to their high transmittance in visible region, high reflectivity in the IR-region and excellent semi-conducting characteristics, fluorine-doped tin oxide films (SnO2: F, Fluorine-doped tin oxide (FTO)) have attracted considerable attention in the energy-saving field, such as architectural glass, thin-film solar cells[1,2,3]

  • FTO films were prepared by atmospheric pressure chemical vapor deposition (APCVD) on glass coated with a barrier layer of SiOxCy9

  • Non-stoichiometric FTO films were deposited by APCVD on a glass substrate coated with a diffusion layer of SiOxCy

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Summary

Introduction

Due to their high transmittance in visible region, high reflectivity in the IR-region and excellent semi-conducting characteristics, fluorine-doped tin oxide films (SnO2: F, FTO) have attracted considerable attention in the energy-saving field, such as architectural glass, thin-film solar cells[1,2,3]. New processes are needed to fabricate FTO films that can withstand these high temperatures without a decrease of performance[5]. A post-heat treatment of the glass at a high temperature (often up to 700 °C) is common to increase the toughness of the glass: a process that is called “glass tempering” in industry. Temperature and time are two crucial parameters to improve mechanical properties. Our previous work[8] found the electrical performance of FTO films deteriorated after being tempered at 700 °C. Heating time should be controlled strictly to obtain good electrical properties. Our aim in this work was to investigate the effects of tempering temperature and time on the microstructural and electrical properties of FTO films during the tempering process and optimize the tempering process

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