Abstract
Ta 2O 5 films were deposited on a rough surface with O 2 cluster ion beam assisted deposition and the reduction of surface roughness was studied. Stoichiometric Ta 2O 5 thin films were deposited with O 2 cluster ion assisted deposition, and the film structure was very dense without porous and columnar structures. Smooth Ta 2O 5 surfaces were realized even though they were deposited on a rough surface when O 2 cluster ion energy was 7 keV. As the surface smoothing effect by O 2 cluster ion irradiation was not dominant at O 2 cluster ion energy of 7 keV, smooth Ta 2O 5 surface was mainly originated by additional deposition of very thin Ta 2O 5 films.
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