Abstract

It is generally accepted that the low-energy electron beam (e-beam) irradiation has a negligible effect on the physical properties of metallic nanostructures during the in-situ imaging and welding inside the scanning electron microscope. Here, a pronounced decrease in the electrical conductivity of Ag nanowires is obtained after contacting the ends by using the e-beam induced deposition nanolithography. A vivid crystal defect migration inside nanowire is observed under the transmission electron microscope, revealing that the e-beam induced internal stress provides an explanation for the remarkable conductivity decrease. These observations indicate that e-beam exposure can cause anomalous morphology change inside Ag nanowire. In addition, the electrical conductivity provides an effective strategy to monitor the related nanostructure change.

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