Abstract
As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations.
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