Abstract

In this work, a novel hybrid technique for reduction of graphene oxide is explored. The hybrid technique involves chemical reduction of graphene oxide coated over oxidized silicon substrate, by minimal exposure to HI acid fumes followed by low temperature thermal annealing under vacuum environment. Observations have shown improved conductivity as compared to other hybrid techniques and low temperature thermal annealing technique.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call