Abstract

The effect of recrystallization processes, taking place during the deposition of silver films on the film structure, was investigated. A normal grain growth is observed, both for films deposited at high temperatures and slowly cooled to room temperature and for films deposited at room temperature and annealed at high temperatures. The recrystallization processes in both cases are found to lead to the formation of identical microstructures and textures of films deposited or annealed at equal temperatures.

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