Abstract
The importance of Al2O3 as a technological material is demonstrated by its use in such widely varying fields as energy production and conversion, catalysis, primary metal production, and communications. Properties of interest include room temperature and elevated temperature strength and fracture toughness, hardness and wear resistance, chemical stability in aggressive environments, high surface area and thermal stability, adhesion of thin metallic films, and dimensional stability. Many of the properties of critical interest are surface controlled.Until recently charged particle techniques have been used primarily to investigate the radiation damage behavior of Al2O3. However, in the last few years ion beam techniques have been used extensively as a means to modify the near-surface properties of Al2O3. One aspect of this work involves the use of ion implantation to produce an amorphous phase on a single crystal α-Al2O3 substrate and the investigation of the recrystallization behavior during post implantation annealing.
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