Recording of transmission phase gratings in glass by ion implantation

Abstract

Transmission phase gratings of grating constants of 4–12 μm have been designed and fabricated in glass via implantation of helium and nitrogen ions of energies in the 500 keV–1.6 MeV range, through photoresist masks of thickness of 3.3 μm. Multienergy implantations were applied, too. Phase profiles of the gratings were measured via interference and phase contrast microscopy and scanning electron microscopy. Quasisinusoidal profiles were obtained for the finest gratings. The highest first order diffraction efficiencies were around 20%. Dependence of the efficiencies of the gratings on the energy and dose of the implantation have been determined.