Abstract

To describe the recombination of charge carriers in Ge via localized states at dislocations a model is developed which accounts for the temperature dependence of measured lifetimes, incorporating at the same time all the features which have been deduced from electrical measurements. It is shown that electron capture occurs via tunnel states and that in hole capture two dislocation bands take part. Zur Beschreibung der Rekombination von Ladungstragern uber an Versetzungen lokalisierte Zustande wird ein Modell entwickelt, das die Temperaturabhangigkeit gemessener Lebensdauern erklart und zugleich alle aus elektrischen Messungen abgeleiteten Befunde umfast. Es wird gezeigt, das der Elektroneneinfang uber Tunnelzustande ablauft und das am Locheinfang zwei Versetzungsbander beteiligt sind.

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