Recombination mechanism of heavily Be-doped GaAsN by time-resolved photoluminescence

Abstract

The optical properties of GaAsN system alloys have not been clarified, particularly for the localized level around the bottom of the conduction band induced by nitrogen atoms. Herein, the recombination mechanism is systematically investigated for heavily Be-doped p-type GaAsN using both continuous-wave (CW) and time-resolved (TR) photoluminescence (PL) characteristics, which is expected to be applied to devices such as a p+-n+ tunnel diode inserted into a multijunction solar cell composed of GaAs system alloys and as the base layer of a heterojunction bipolar transistor. The S-shape characteristic weakened with increasing hole concentration (p) in the CW-PL spectra of Be-doped GaAsN. Both short and long lifetimes were evaluated using TR-PL decay curves. Specifically, the long lifetime was distributed between 0.7 and 1 ns independent of temperature and p. This long lifetime corresponds to radiative recombination lifetime from a localized level, supporting that a localized level is formed in Be-doped GaAsN despite high p on the order of 1019 cm−3. Electrons are tightly bound at a localized level, equivalent to this long lifetime, whereas the electron lifetime decreases with increasing p, resulting in the S-shape characteristic vanishing in the temperature dependence of the CW-PL spectra for ultraheavily Be-doped GaAsN with p of 5 × 1019 cm−3. Moreover, this S-shape characteristic vanished in the temperature dependence of TR-PL spectra for moderately Be-doped GaAsN with p of 8 × 1018 cm−3, indicating that the density of states is limited for a localized level.