Abstract
High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation. Recently, the scientific community has seen an increasing development of the multicomponent coatings, improving their properties compared to conventional films. Technically, different strategies have been exploited to fabricate HEFs. Magnetron-sputtered HEFs have made significant advancements in this field. HEFs have various applications given their interesting performances. This article overviews the development and the outcome of HEFs prepared using the magnetron sputtering technique. The classification of HEFs is reported. The effect of magnetron sputtering parameters on the microstructural, mechanical, electrochemical and thermal properties of HEFs is also discussed. Applications of HEFs are reported in the last section.
Highlights
The surface is a key factor to be considered in the development of materials with high performance
The same group reported the synthesis of another High-entropy films (HEFs) (AlCrTiVZrN) deposited by High Power Impulse Magnetron Sputtering (HiPIMS) and a DC magnetron sputtering (DCMS) process
Several HEFs have been fabricated by magnetron sputtering and shown to have better corrosion resistance
Summary
The surface is a key factor to be considered in the development of materials with high performance. Since 2004, a new approach was reported that involved developing high-entropy alloys (HEAs), which can be an alternative solution to improve the physical and the chemical properties of multi-element alloys. HEFs are under extensive study due to their superior structural properties (multi-element solid solutions) and excellent mechanical and tribological performances. The present review gathers recent works on HEFs prepared using magnetron sputtering techniques by focusing on the deposition parameters’ effect on their properties and performances. This includes the evolution of their structural, mechanical, tribological and electrochemical properties as a function of various factors. A reactive sputtering mode can be implemented by introducing reactive gases (N2, CH4, C2H2 or O2) in the vacuum chamber in order to synthetize nitrides (HENF; known as High-Entropy superlattice Nitride Films [49,50]), carbides (HECF) or oxides (HEOF)
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