Abstract
In this paper, the effect of different preparation process on the secondary electron emission performance was investigated. The different doping methods and preparation techniques such as Solid-Solid doping(SS), Liquid-Solid (LS) doping, Liquid-Liquid (LL) doping, Spark Plasma Sintering (SPS), Air Plasma Spray (APS) method, were introduced into this kind of materials. The microstructure of samples was observed with Hitachi S-3500N Scanning Electron Microscopy, equipped with Oxford Inca EDX equipment. The self-designed apparatus was used to evaluate secondary electron emission yields (δ) of samples in the ultra-high vacuum chamber. The secondary emission properties were measured at 600°C in order to avoid the influence of the thermionic emission.
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