Year-end Sale % OFF 
Abstract
Nanoimprint lithography is a low cost and high throughput technology to fabricate nanostructures with excellent resolution. However, traditional thermal nanoimprint limits its application field because high temperature induces many problems. Low temperature nanoimprint lithography, including ultraviolet nanoimprint lithography and room temperature nanoimprint lithography, can reduce or remove thermal cycle, overcome the sticking problem, alleviate the alignment errors due to different coefficients of thermal expansion and pattern polymer based materials that are intolerant to high temperature. Recent development of these three low temperature NIL techniques was discussed from the aspects of new resist, stamp, process and application. Low temperature nanoimprint has wide application in the fields of optoelectronics, displays and bio-applications.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
