Abstract
We have constructed a new gas-filled detector in which we combine a Micromegas with a CMOS pixel chip. In a next step, a procedure to construct a Micromegas-like grid onto a Si wafer, using chip production technology (‘wafer post processing’), has been developed. An ageing test of a Micromegas chamber has been carried out. After verifying the chamber's proportionality at a very high dose rate of X-rays, we irradiated the device until ageing became apparent.
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