Abstract
During vacuum deposition of multicomponent films, in order to achieve a consistent film composition the deposition rate of each component must be precisely and independently controlled. Conventional devices such as piezoelectric quartz crystal and ionization-type monitors for controlling the film thickness and deposition rate have rather limited usefulness in controlling alloy deposition processes because of their inability to distinguish different materials. Several techniques (mass spectrometry, atomic absorption spectroscopy and electron impact emission spectroscopy) have recently been used for qualitative and quantitative analyses of multicomponent evaporants. This paper reviews the physical principles of these techniques. The advantages and drawbacks of each technique are discussed.
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