Recent applications of plasma-based ion implantation and deposition to microelectronic, nano-structured, and biomedical materials

Abstract

Plasma-based ion implantation and deposition is a versatile surface modification technique and has been applied to a myriad of areas, particularly microelectronics, biomedical engineering, and nanotechnology. In this invited paper, recent work conducted in the Plasma Laboratory of City University of Hong Kong pertaining to new applications to microelectronics, biomaterials, and nanotechnology is reviewed. The work on high dielectric constant (high-k) thin films used in deep-submicrometer integrated circuits is first described. By using plasma nitridation and co-doping, the thermal stability and other properties can be improved. Plasma-based technologies can also enhance the optical properties of nano-structured materials and our recent work on Mo-doped nano-diamond-like carbon is described. We have been working on many types of biomaterials. For instance, single-crystal silicon is the most important materials in microelectronics. A good understanding of its biocompatibility and bioactivity bodes well for its applications to biosensors and bioMEMS (bio-micro-electro-mechanical system) and our recent findings have disclosed means to improve its bioactivity and revealed the cytotoxicity of the materials. In addition, enhancement of the antibacterial properties of polymeric materials using plasma-based technology is discussed.