Abstract

Chemical vapor deposition (CVD) on metal foils is regarded as the most effective method to produce large-area graphene with properties in line with the requirements of an extensive range of electronic and optical applications. For the CVD of graphene, ethanol is a versatile carbon source alternative to the widely used methane. In this review we report on the current progress in this field showing how the CVD parameters can be modulated to gain full microstructural control on graphene grown on Cu foils. Using ethanol vapor, graphene can be grown as a continuous film with mono- or multi-layer thickness, and also in the form of isolated crystals on pre-oxidized Cu substrates. Overall, ethanol-CVD allows a controllable degree of crystallinity and tunable electrical/optical characteristics in the grown samples. In turn, this control translates into a superior versatility for device design and related applications.

Highlights

  • In hindsight, the early observations of atomically thin graphite crystals grown onto metal surfaces exposed to hydrocarbons at high temperature probably did not gain due attention from the scientific world [1]

  • We offer a summary of the effect of the parameters on the structural ethanol-based chemical vapor deposition (CVD) on Cu

  • The reported results were compared to those commonly obtained by methane-CVD

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Summary

Introduction

The early observations of atomically thin graphite crystals grown onto metal surfaces exposed to hydrocarbons at high temperature probably did not gain due attention from the scientific world [1]. Researchers have learned how to gain control of domain size, layer number, grain boundary density, and defects of wafer-scale CVD graphene and have proved that methane is an effective gas precursor for the growth. The first section concerns growth of graphene continuous graphene films comparable those made from methane-CVD, on the role of process flow, with qualitytocomparable to those made fromfocusing methane-CVD, focusing on temperature, the role of gas process and time. In this context, one of the key features of the ethanol-CVD, the possibility of using ultra-fast temperature, gas flow, and time. To a perspective on a topic of interest for several nanotechnology applications

Tuning of Growth Parameters
Ultra-Fast Growth
Conclusions
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