Abstract

Studies in CVD (Chemical Vapor Deposition) diamona growth for large area scaling up have been carried out using the Hot Filament Technique (HF) and showed some advantages compared with others techniques. The main advantages are the low cost installation, operation and maintenance and easier control of growth parameters. In this work we present studies of CVD diamond growth by a HF asslstetl tecnnique using an alternating current (Ae) filament power supply. The AC power supplyis used instead of direct current (De) in order to decrease some cost related to diamond growth in large substrate area. It is observed that diamond growth parameters are not affected when AC power supply is used. [)iamond film quality and growth rate as a function of the substrate temperature are similar to DC supply. Also the AC and DC level of the filament temperature were measuredusing a conventional silicon detector. Raman scattering spectroscopy and scanning electronic microscopy techniques were widely used for analysisof the quality and morphology films.

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