Abstract

We describe a simple concept of an <i>in situ </i>photolithographic technique by using a liquid crystal display panel as a configurable mask and a CCD (charge coupled device) camera as a simple imaging system. The successive operation of imaging and configurable masking enabled a real-time projection lithography process by the selective exposure of light through LCD (liquid crystal display) panel. A correction of a defect pattern could be also demonstrated by optimizing the exposure conditions and aligning the mismatches between imaging and the corresponding lithographic patterning.

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