Abstract
We report the realization of both excellent optical and electrical properties of nanostructured multicrystalline silicon solar cells by a simple and industrially compatible technique of surface morphology modification. The nanostructures are prepared by Ag-catalyzed chemical etching and subsequent NaOH treatment with controllable geometrical parameters and surface area enhancement ratio. We have examined in detail the influence of different surface area enhancement ratios on reflectance, carrier recombination characteristics and cell performance. By conducting a quantitative analysis of these factors, we have successfully demonstrated a higher-than-traditional output performance of nanostructured multicrystalline silicon solar cells with a low average reflectance of 4.93%, a low effective surface recombination velocity of 6.59 m s−1, and a certified conversion efficiency of 17.75% on large size (156 × 156 mm2) silicon cells, which is ∼0.3% higher than the acid textured counterparts. The present work opens a potential prospect for the mass production of nanostructured solar cells with improved efficiencies.
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