Abstract
The formation of self-organized Si nanostructures induced by Mo seeding during normal incidence Ar+ ion bombardment at room temperature is reported. Silicon surfaces without Mo seeding develop only power-law roughness during 1000eV ion bombardment at normal incidence, in agreement with scaling theory expectations of surface roughening. However, supplying Mo atoms to the surface during ion bombardment seeds the development of highly correlated, nanoscale structures (“dots”) that are typically 3nm high with a spatial wavelength of approximately 30nm. With time, these saturate and further surface roughening is dominated by the growth of long-wavelength corrugations.
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