Abstract
The recently developed technique of real time spectroscopic ellipsometry (SE) has been applied to characterize the nucleation of diamond on c-Si by W filament-assisted chemical vapor deposition, leading to improved control over the process. Specifically, techniques are developed which minimize W contamination at the diamond/substrate interface; calibrations are performed which determine the temperature of the top ∼250 Å of the substrate under growth conditions; and alterations in gas flow conditions are implemented in response to diamond growth for a reduced induction time. With these procedures in place, real time SE provides the induction time, nucleation density, and mass thickness, and is in quantitative agreement with ex situ scanning electron microscopy.
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