Real Time Nanoscale Cleaning Phenomenon Observation During Enforcing MHz Wave By Evanescent Field

Abstract

Post-CMP Cleaning phenomenon is considered as the detachment of the nanoparticle from the substrate surface to be cleaned, and the occasional reattachment of the nanoparticle to surface in nanoscale. However, residual contamination on the substrate has been usually inspected only after the cleaning process. Therefore, the cleaning mechanism of nanoparticles has not already clearly known. Hence, we have established dynamically observation of cleaning phenomena near the surface by applying the evanescent light which occurred a few hundred nm from the surface. In this article, detachments of φ30, 50, 70 nm silica particles and the acoustic cavitation effect were observed during enforcing 1.1 MHz waves in 60 frames per second. The main phenomenon was described that some of each silica nanoparticles were randomly intermittently detached from the surface when the cavitation effect repeatedly irregularly occurs and decays near the surface or remained on the surface during enforcing MHz wave.