Real-Time Detection of Self-Assembled Monolayer Formation Using CMOS-Based Nanocapacitor Arrays

Abstract

A sensing platform based on array of nanoelectrodes is used for high-frequency impedance measurements that allow detecting analytes beyond the electric double layer [1,2]. The massively parallelized architecture is based on complementary metal-oxide-semiconductor (CMOS) nanocapacitors. The small dimensions of the electrodes and associated readout circuitry on the CMOS chip yield minimal parasitic capacitance, which allows applying AC frequencies up to 50 MHz. Herein we will demonstrate the measurement of self-assembled monolayer (SAM) formation in real time on the array of nanoelectrodes fabricated on this CMOS platform. The average response of the thiol formation on the nanoelectrode was monitored at frequencies ranging from 1.6 MHz to 50 MHz. The measurements at different frequencies provides complementary information on the assembly process.