Abstract
Structure dependent differential tunneling conductance, dI/dV, profiles obtained using scanning tunneling microscopy on both (110)-cleaved surfaces and (001)-growth surfaces in InAs/GaSb and InAs/InxGa1-xSb quantum wells (QWs), which are platforms of two-dimensional topological insulator (2D-TI), clearly demonstrated the edge states formed on the 2D-TI surfaces. The results were confirmed by kp-based electronic structure calculations, which demonstrated that the edge states extended to the 10 nm range from cleaved surfaces generated in the appropriately designed InAs/(In)GaSb QW systems.
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