Abstract
CO2 reforming of CH4 catalyzed by porous SiO2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nanoparticles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of ~10 % at 850 °C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.
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