Abstract
Chromium carbide films were deposited by r.f. reactive magnetron sputtering of chromium in an acetylene plasma. The carbon-to-chromium ratio in the films was found to increase with substrate temperature and acetylene partial pressure, resulting in a supersaturated solid solution of carbon in a chromium matrix and the Cr 23C 6 phase. The microstructure and composition of the films were found to be very sensitive to the deposition temperature and incorporated hydrogen and hydrocarbon radicals.
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