Abstract
The crystal structure of a low melting difluorinated silicon reagent (bromodifluoromethyl)trimethylsilane is described. Hexamethylphosphoramide (HMPA) serves as an efficient Lewis basic activator to decompose the silicon reagent to generate difluorocarbene along with the formation of silyl-capped HMPA cation. The bromide salt with Me3Si-HMPAcation was also obtained by interaction of bromotrimethylsilane with HMPA and was characterized by X-ray analysis. Interaction of silanes with HMPA was evaluated by quantum chemical calculations, which demonstrated that the Lewis base provides a significant decrease of the transition state energy for the generation of difluorocarbene by an attack at the silicon atom.
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