Abstract
SiF2 and SiF4 have been identified as gas phase products of the reaction between atomic fluorine and silicon. Atomic fluorine is supplied by a low density molecular beam hitting a silicon target in a high vacuum. Reaction products were detected by mass spectrometric measurements. Activation energies for the production of SiF2 and SiF4 were found to be 0.09±0.02 and 0.15±0.02 eV/°K, respectively, in good agreement with the values measured by flowing afterglow techniques. The reaction probability for the reaction 4F+Si→SiF4 was found to be 0.016 at 100 °C.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
