Abstract
Research on the kinetics of electrode reaction during copper electro-deposition on the surface of TiO2/graphite has been conducted. The aims of this research are to determine the ratio of anodic reaction rate to cathodic reaction rate , the ratio of anodic rate constant to cathodic rate constant , the equilibrium constant when the reaction reach equilibrium condition and to study the polarization in the electro-deposition reaction. Copper was deposited electrochemically from CuSO4 solution at various concentration i.e. 0.1 M; 0.2 M; 0.3 M; 0.4 M; 0.5 M. In every 5 minutes during electro-deposition process, the pH changes in anode cell was recorded and the change of Cu2+ concentration was also analyzed by spectrophotometric method. The result shows that the reaction order of Cu2+ reduction is first order and the oxidation of H2O in anodic cell is zero order. The ratio of anodic rate constant to cathodic rate constant, is 4.589´10-3 ± 0.071´10‑3. It indicates that the reaction rate in cathode is larger than the reaction rate in anode and it allowed polarization. The electrochemical cell reached equilibrium after 25 minutes with the equilibrium constant is 8.188´10-10 ± 1.628´10-10.
Highlights
Semiconductor materials play important role in human life such as for photocatalyst, sensor, electronic devices or solar cells
The photocatalyst powders have been applied for photocatalytic treatment of waste water, degradation of dye waste, disinfection treatment of water or fabrics etc
Immobilization of photocatalyst on a substrat has been investigated by some researchers such as Yang et al.[1] who succesfully grown mesoporous silica layer on graphite with the presence of surfactant cetyltrimethylammonium chloride (CTACl)
Summary
Semiconductor materials play important role in human life such as for photocatalyst, sensor, electronic devices or solar cells. The photocatalyst powders have been applied for photocatalytic treatment of waste water, degradation of dye waste, disinfection treatment of water or fabrics etc. The immobilized form of photocatalyst such as in the form of thin layer on substrat has been studied intensively in order to reduce post treatment cost of separation between the product of photocatalytic degradation and its photocatalyst powder and the immobilized form is easier to be recycled. Immobilization of photocatalyst on a substrat has been investigated by some researchers such as Yang et al.[1] who succesfully grown mesoporous silica layer on graphite with the presence of surfactant cetyltrimethylammonium chloride (CTACl). Rahmawati et al.[2] deposited TiO2 film by chemical bath deposition with the assistance of surfactant molecules of cetyl trimethyl ammonium borate (CTAB)
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