Rare-earth-doped silica waveguides fabricated by flame hydrolysis deposition and aerosol doping

Abstract

We have fabricated rare-earth-doped SiO2-P2O5 planar films on silicon substrate by using flame hydrolysis deposition, incorporating the rare-earth ions by an aerosol doping technique, for the first time to our knowledge. Rare-earth-doping levels in the glass were dependant on the nebulized solution strength and the delivery rate of the aerosol to the torch. The aerosol doping technique has the advantage over solution doping of directly incorporating the rare-earth ions into the soot during the deposition and giving control of the doping profile through the film by contolling the transfer of the aerosol to the torch during the deposition. The aerosol doping technique is described, as well as the fabrication and optical assessment of channel waveguides with a view to realizing waveguide lasers. Moreover, the long term goal is to accomplish mono­lithic integration of active and passive optical components. This may be achieved by selective area doping of planar films. The method of selective area doping is discussed for aerosol doping.